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金刚石薄膜的研究现状和展望

时间:2017-08-11 数学毕业论文 我要投稿

金刚石薄膜的研究现状和展望

摘要:  由于金刚石薄膜具有最高的硬度,最高的热导率,高的绝缘性,高的光透过率,以及能耐酸、耐热、耐辐射等优异性能,所以其能广泛地应用于社会中的各领域。自人们使用化学气相沉积(CVD)法在非金刚石的衬底上形成金刚石膜后,各国技术人员便都在不断地深入研究CVD法合成金刚石薄膜的技术,以保证能达到低成本投入、高效益收入、多方面应用。本文介绍了金刚石薄膜的结构以及在这种结构下金刚石薄膜所具有的独特性能,重点介绍了金刚石薄膜制备方法的进展以及金刚石薄膜在社会各领域的应用情况,并列出了国内外金刚石薄膜研究进展的差异,以反映出国内金刚石薄膜未来发展的方向,进而简单论述了金刚石薄膜未来发展的趋势。

关键字:  金刚石薄膜;化学气相沉积CVD;制备及应用

Diamond thin film research present situation and forecast

Abstract:  Because diamond films have the highest hardness, the highest thermal conductivity, high insulation, high optical transmittance, and can also express excellent acid, heat and radiation resistance performance, so they can be widely used in various fields of the society. Since the use of chemical vapor deposition (CVD) method in the non-diamond substrates to fabricate diamond film, National technical staff will continue to have study CVD synthetic diamond film technology in-depth to ensure that input can achieve low-cost, high-income returns, many applications. This paper describes the structure of diamond films and the unique properties of this diamond films. In this paper, I focus on the introduction of diamond film preparation methods, the progress and the application of diamond thin films in all areas of society. In the end of the paper, the domestic diamond films progress is compared with foreign ones to reflect domestic diamond film direction for future development, and the future development of diamond film trend is briefly discussed.

Keywords:  Diamond thin film;  Chemical vapor deposition CVD;  Preparation and Application
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